Abstract
Pattern profile abnormality on a spin-on glass (SOG) substrate is investigated for the chemical amplification resist system SAL601. The resist dissolution rate, which is strongly related to the generated catalyst concentration, is abnormally enhanced near the SOG substrate. Resist profile simulation suggests that this phenomenon depends on the diffusion effect of a catalyst or its scavenger. Based on resist sensitivity variation due to humidity, and FTIR analysis of the SOG, it is considered that H 2O in a SOG substrate is the diffusion component acting as the catalyst scavenger.
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