Abstract
Cluster formation mechanism with large vaporized metal clusters is discussed, and several specific applications of ionized cluster beam (ICB) to films of metallurgical interest are described. In the ICB deposition and epitaxy, the crystallographic, mechanical, electrical, optical, and magneto-optical properties of the metal and intermetallic compound films can be controlled by adjusting the acceleration voltage and the electron current for ionization. Metal-based and intermetallic compound-based films with characteristic advantages are reported; Cu films with strong adhesion and high packing density, Cu–Ni alloy films with controllable crystal structure and high strain gage, CdTe–PbTe superlattice with very thin and multilayered structures, and Cd1−xMnxTe films with large Faraday rotation and controllable composition and crystallinity. Thus, the ICB technique is found to have a high potential and unique features as an emerging technique for functional film formation and surface modification.
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