Abstract
Diamond films have been achieved, on molybdenum substrates, with two chemical vapour deposition techniques: d.c. and h.f. plasma jet systems. Gas mixtures with methane, hydrogen and CO 2 have been used. The d.c. plasma system gave the highest growth rate (400 μm h −1) when oxygen was added to the reactant gases. Feasibility attempts were conducted with the h.f. system. The growth rate obtained, in this case, was 50–60 μm h −1. The films were characterized by different methods such as X-ray diffraction, scanning electron microscopy, electron microprobe analysis, secondary-ion mass spectrometry and Raman spectrometry.
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