Abstract
A method for patterning micro-scale features in a poly(acrylic acid) (PAA) film for engineering applications has been developed. Because PAA is a water-soluble polymer, careful attention has to be given during the development portion of the photolithographic process. To obtain well-defined patterns, development time was reduced by half following a regular photolithography exposure step. The remaining photoresist, and the PAA underneath it, were removed using a plasma ash process. After stripping the photoresist, polygonal windows such as triangles, rectangles, squares, pentagons, hexagons, heptagons, and octagons were created. This plasma ash process for patterning micro-scale features in PAA holds potential for fabrication of polymer microstructures, sacrificial layer micromolding, and patterned substrate micromolding. As a proof of concept, we applied these patterns to a solder-based self-assembly process to form 3D polyhedra.
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