Abstract

The production of alloys via implantation is of great interest. Using the perturbed γγ angular correlation technique we have studied Cu implanted with In atoms (< 1000 ppm) varying implantation energy and temperature and performing thermal annealing. It is shown that for a complete picture of the microscopic situation it is necessary to know the impurity's lattice site and lattice surroundings.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call