Abstract
YBa 2Cu 3O 7 − x films were prepared by a novel low-pressure RF-plasma deposition apparatus. Films were deposited on polycrystalline Al 2O 3 and ZrO 2 substrates, the thickness of a typical film is 10 to 20 μm. The films were characterized by scanning electron microscopy, energy dispersive X-ray analysis, and resistivity measurements. The influence of deposition parameters such as plasma pressure, substrate temperature, as well as annealing conditions on the film composition, microstructure, and superconductivity are discussed.
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