Abstract
Y-Ba-Cu-O films were prepared on (100)MgO single crystal substrates by ECR plasma sputtering. As-deposited films without substrate heating were amorphous and electrically insulating. The amorphous film was crystallized to YBa2Cu3O7-x by postannealing at 930°C for 1 min in O2 gas, and the Tc of the postannealed film was 70.5 K. The film prepared at the substrate temperature of 650°C was crystalline YBa2Cu3O7-x and the Tc of the film without any postannealing was 73 K.
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