Abstract

K xWO 3+ x 2 ( x = 0.3) thin films have been prepared by the thermal vacuum evaporation technique. Depending on the substrate temperature during deposition, either amorphous or crystalline films could be obtained. X-ray diffraction patterns and pole-figure information revealed that fresh crystalline films deposited on a hot (about 400°C) substrate of indium-tin oxide on glass microscope slides had a preferred orientation, with the c-axis perpendicular to the surface of the film. SIMS depth profiles and RBS experiments were used to confirm the stoichiometry and uniformity of the chemical components in the thermally deposited films.

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