Abstract
Targets of 135Ba and 235U have been prepared by the technique of heavy ion sputtering. Rolled foils of 208Pb and 197Au were used to support 250–500 μg/cm 2 layers of barium. Uranium films have been prepared by sputtering UO 2 onto 1 mg/cm 2 titanium foils. Uranium deposit thicknesses of 300 to 1800 μg/cm 2 have been prepared.
Published Version
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