Abstract
In order to determine the influence of different types of magnetron sputtering (MS) depositions on the characteristics of Al-doped ZnO (AZO) thin films appropriate for applications as transparent electrodes in thin-film solar cells, transparent conducting AZO thin films were prepared on glass substrates at 200 °C by direct current (dc) magnetron sputtering (dc-MS), radio frequency (rf)-MS and rf power superimposed dc-MS (rf + dc-MS) depositions using an MS apparatus with the same AZO target. AZO thin films prepared by an rf + dc-MS deposition exhibited both a higher deposition rate than that found with rf-MS depositions and a lower resistivity or higher Hall mobility than those found with dc-MS. The lower dc sputter voltage featured in rf-MS and rf ± dc-MS depositions, producing smoother surface morphology and better crystallinity than obtained with dc-MS depositions. The light scattering characteristics of surface-textured AZO thin films prepared by various types of MS depositions were evaluated by observing the surface texture and measuring the optical transmittance and the diffusive component; wet-chemical etching of the thin film surface was performed in a 0.1% HCl solution. The obtainable haze property in the range from visible to near infrared in AZO films prepared by an rf + dc-MS deposition was markedly better than that obtained with dc-MS depositions.
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