Abstract
Porous anodic alumina (PAA) template is widely used to prepare ordered nanostructure materials. But conventional PAA templates have been restricted for application in micro-electro-mechanical systems (MEMS) technology due to limitations such as shape and brittleness. In this article, a novel process of fabricating alumina porous template based on silicon wafer is described. Porous alumina films were formed by two-step anodization of aluminum layers sputter deposited on silicon wafer. The pore diameters range from 80 to 100 nm. The Pilling–Bedworth ratio of Al/Al2O3 was measured and calculated. Thickness of PAA template can be precisely controlled. This research provides an effective tool to nanofabrication in MEMS technology.
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