Preliminary Results of Low Energy Sputter Yields of Boron Nitride due to Xenon Ion Bombardment

Abstract

Abstract : We describe the development of an experimental apparatus geared towards measurement of boron nitride sputtering by low energy ions. A four-grid system is used to achieve a collimated beam at low energy (<100 eV). A weight loss approach is used to measure total sputter yields and a quartz crystal microbalance (QCM) is used to measure differential sputter yield profiles of condensable components. Integration of the QCM profiles also gives total sputter yields of condensable components. We report initial results of total and differential sputter yield measurements of three grades of boron nitride due to bombardment by xenon ions with ion energies in the range of 60-250 eV and at ion incidence angles of 0, 15, and 45 degrees from normal. Comparison with past measurement results are made where possible.