Abstract
Mixture systems of copolymer of methyl methacrylate‐methacrylic acid P(MMA‐MA) and terpolymer of methyl methacrylate‐methacrylic acid‐methacryloyl chloride P(MMA‐MA‐ClMA) have been synthesized and investigated as a positive electron resist. These resists form intermolecular acid anhydride bonds after baking, resulting in improved sensitivity and thermal stability while maintaining high resolution as compared with poly(methyl methacrylate). The polymer containing 5 mole percent (m/o) methacrylic acid (MA) and 0.5 m/o methacryloyl chloride (ClMA) has a sensitivity of at an accelerating voltage of 30 kV, a thermal stability even above 140°C. The sensitivity of the polymer containing 0.36 m/o ClMA is , which is 20 times that of PMMA.
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