Abstract
Polycrystalline BiFeO3 films were fabricated by radio frequency magnetron sputtering using a Bi1.1FeO3 target onto the glass and Si/SiO2/Ti/Pt substrates respectively. The samples which were annealed with different annealing conditions are pure without impurities. Our results indicate that there are relatively wider growth conditions for pure polycrystalline BFO phases.
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