Point Defect Interactions with Extended Defects in Silicon

Abstract

AbstractWe investigated the interaction of point defects (vacancy and self-interstitials) with an intrinsic stacking fault in silicon. The calculations were carried out using ab initio total energy methods. The results show that point defects at an intrinsic stacking fault display a different behavior as compared to the same defect in the crystalline environment. This is evidenced by differences in formation energies and electronic structures. These results suggest that there is migration of point defects from the bulk to a stacking fault. This could affect the dislocation mobility in the crystal.