Effects of extended defects on the properties of intrinsic and extrinsic point defects in silicon

Abstract

We investigated the interaction of intrinsic and extrinsic point defects with stacking faults in silicon. The calculations were carried out using ab initio total energy methods. The results show that the formation energies of intrinsic defects and impurities (P, As, and Al) are lower at the stacking fault as compared to the respective defects in crystalline environment. Therefore, stacking faults should have a large concentration of defects, and they should play an important role on the mechanisms of dislocation motion.