Plasma parameters of the hollow cathode magnetron inside and downstream

Abstract

AbsractThis paper deals with the characterization of ionized physical vapour deposition (IPVD) by means of a hollow cathode magnetron (HCM). The pressure is 10 mTorr with 2.2 kW discharge power. A Langmuir probe was used to study the spatial distribution of plasma parameters such as the electron density and temperature, electron energy distribution function, plasma space and floating potentials inside and outside the HCM. It was found that the high density plasma inside the cathode occurs near the side surface in the ionization region. The plasma density on the axis is reduced. The EEDF shows the presence of electrons with energy up to 30 eV. The measurements showed that ionization occurs not only within the cathode but also outside. The magnetic trap placed around the anode ring increases the density and homogeneity of the plasma several times in the region of its location.