Abstract
In this work the use of two metallo-organic compounds, titanium tetrakisdialkylamides, was investigated with a pulsed d.c. plasma-assisted chemical vapour deposition process to deposit layers on steel substrates and hard metals. The layers have been studied by scanning electron microscopy X-ray diffraction and wavelength-dispersive X-ray analysis. It is shown that chlorine-free titanium carbonitride coatings can be obtained by metallo-organic chemical vapour deposition even at substrate temperatures of lower than 450°C.
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