Abstract
The deposition of aluminium containing, especially aluminium oxide coatings on steel and cermets was performed by the plasma assisted chemical vapour deposition (PACVD) process using a metallo-organic compound (AlH 3·NEt 3) as precursor. The usefulness of the precursor in the PACVD process was investigated. The deposition process of non-conducting aluminium oxide layers was developed by pulse d.c.-PACVD. Optical emission spectroscopy (OES) was used for in situ process control. The investigation by OES enables the identification of the species in the discharge (Al and other) and thus supports the successful process development. The structure, chemical composition, bonding types in the layers, hardness, adhesion, roughness, friction coefficient and friction behaviour by a pin on the disk test have been investigated. The layers consist of Al, O and traces of carbon using the metallo-organic precursor. The friction coefficient is >50% less compared to an uncoated steel substrate up to the breaking through of the layer by a pin on the disk test.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
