Abstract
Abstract The pulsed d.c. plasma-assisted chemical vapour deposition process using four metallo-organic compounds as precursors (MOPACVD) was investigated. The compounds contain titanium or zirconium as metal to deposit Ti(C,N) or Zr(C,N) layers on steel substrates or hard metals. The influence of experimental parameters such as gas pressure, coating temperature and precursor evaporation temperature on the layer properties has been examined. For in-situ process control optical emission spectroscopy was used. It is shown that it is possible to decrease the coating temperature to 300°C and to deposit chlorine-free layers by MO-PACVD.
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