Abstract

Aluminum is one of the candidate materials of the vacuum chamber and components in the ultra-large scale integration device production facilities, because of high thermal conductivity and minimizing weight. For that purpose, their surface must be smooth and passivated so as to have a low outgassing rate. An electropolishing method to obtain a mirror-finish and pit-free smooth surface has been developed by controlling the flow of the electrolytic fluid during polishing. The polished surface, which shows an average roughness of 0.03 μm was found to be covered with an oxide film of 200 nm thick as determined by Auger electron spectroscopy, indicating a chemically stable surface. The outgassing rate measurement using a conduction-modulation method shows the value of 10−10 Pa m3 s−1 m−2, after baking treatment at 150 °C.

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