Abstract
Abstract The oxidation in air of polycrystalline nickel samples at bulk temperatures of 400°C and 500°C under both infrared oven heating and high flux visible/near u.v. irradiation (⩾ 1 MW/m 2 ) is examined. The oxide thickness is found to be over 400% greater under photo-irradiation at 3.5 MW/m 2 and 400°C bulk temperature than under infrared irradiation at an equivalent temperature. Also, the oxide thickness is found to increase linearly with increasing flux. This photo-enhanced oxidation is believed to be mainly due to electronic excitation of the surface adsorbed molecular oxygen species with subsequent enhanced dissociation. This leads to increased oxidation kinetics and ultimately to the observed increase in oxide thickness.
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