Abstract
Abstract Photo-assisted MOCVD has been applied to the fabrication of thick film YBa 2 Cu 3 O 7− x for wires and tapes. The application of photo-irradiation as the sole source of energy for the MOCVD reaction has resulted in extremely rapid growth rates for YBCO films with high superconducting performance. Typical YBCO films of thickness >1 μ m exhibit J c ∽1×10 6 A cm −2 and T c >90 K on single crystal oxide substrates. Such films have now been integrated to metal substrates including both single crystal Ni(100) and roll-textured nickel foil. YBCO films grown on these substrates with CeO 2 and YSZ buffer layers show J c >3×10 5 A cm −2 for films of >1 μ m thickness grown in 2–4 min time. Such performance for thick films made in such a short time is promising for YBCO wire fabrication with optimization of the photo-assisted MOCVD process expected to yield J c >1×10 6 A cm −2 for 1–5 μ m thick YBCO films on flexible nickel substrates.
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