Abstract
Laser-pulse-induced melting, interdiffusion, and rapid resolidification are applied to deposited Au-Si thin films of various compositions. It is found that, if 30-ns pulses are used, amorphous Au-Si films can be produced over a compositional range 9–91 at.% Au. The stability of the amorphous phases varies with their composition. Thermal decomposition involves the formation of a single-metastable silicide with a hexagonal structrue. Application of 300-μs laser pulses directly leads to formation of the same compound.
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