Abstract
This paper discusses the application of iterative phase retrieval method to phase measurement in optical lithography. A simple algorithm was developed for reconstructing phase information from image intensity distributions measured under different defocus conditions. The phase distribution in the image plane and in the pupil plane are reconstructed from the images obtained using the micro-lithography simulation microscope, MSM100 (Zeiss). Two applications of this method in optical lithography meteorology were investigated. First, the phase transmission of phase-shifting masks was successfully measured both for alternating and for attenuating type masks. The reconstructed phase showed that the uniform background of light leaking from the opaque regions on the mask can affect the phase in the image plane. Second, the possibility of using this method in measuring aberrations of projection optics was examined.
Published Version
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