Abstract
AbstractWe have fabricated a poly-Si TFT with double gate insulator composed of ECR oxide and APCVD oxide to improved the performance of poly-Si TFTs. The poly-Si TFT with double gate oxide exhibits the remarkable enhancement of the electrical parameters compared with the conventional poly-Si TFTs which has APCVD gate oxide, such as improvement of the subthreshold swing and the low threshold voltage. The proposed poly-Si TFT has a higher oxide breakdown electrical field and the device characteristics are not degraded significantly after an electrical stress. It is found that the ECR oxide plays a key role to improve the device performances and prevent the poly-Si TFTs from degradation due to the electrical stress.
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