Abstract
A new gas jet Z-pinch extreme ultraviolet (EUV) light source having double gas jet electrodes has been developed. It has two nozzles and two diffusers. The EUV emission is collected from the side of Xe pinch plasma, which is generated in a gap between the inner nozzle and corresponding diffuser. A cylindrical shell of He gas curtain produced by the outer nozzle is specially designed for shielding the debris and suppressing the inner gas expansion. We have estimated EUV energy of 1.22 mJ/sr/pulse for a 2% bandwidth at 13.5 nm in the presence of the gas curtain. The estimated diameter and length of EUV source in FWHM are 0.07 mm and 0.34 mm, respectively, whereas the same in FW 1/ e 2 are 0.15 mm and 1.2 mm, respectively.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
