Abstract
A new 200 keV high current implanter has been manufactured. The implanter contains a ‘CHORDIS’ ion source, which is capable of producing high current beams of most elements. The implanter is designed for 5–10 mA beam current and has a flexible beam shaping system consisting of a magnetic beam scanning system. The target chamber contains a water cooled sample manipulator with three remote controlled movements. The maximum implant area is 40 × 40 cm 2.
Full Text
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call