Abstract

Peak value degradation of heavy-ion induced transient currents in Metal-Oxide-Semiconductor (MOS) capacitors fabricated on n-type and p-type 6H-SiC was observed. The capacitances of MOS capacitors measured during the ion irradiation suggest that the depletion layer width decreased with increasing number of incident ions and was saturated. Since the number of incident ions obtained at the peak current saturation corresponded to that at the saturation of the capacitance, the decrease in peak current can be interpreted in terms of the decrease in the depletion layer width.

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