Abstract
Pattern transfer onto semiconducting carbon films with diamondlike properties using optical lithography and radio frequency oxygen plasma etching is reported. Titanium, aluminium, and gold were used as masking materials during oxygen etching. It was found that the titanium mask was most suitable for this process because of better resistance to the oxygen plasma. The microstructures observed were very uniform and well defined.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
More From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.