Abstract
The emergence of near‐eye displays for an extended reality (XR) has promoted the development of high‐resolution electroluminescence quantum dot (EL‐QD) devices. Direct photo‐lithography using photosensitive moieties is an effective technique for producing micrometer‐sized patterns of colloidal quantum dots. Here, we fabricated red, green, and blue quantum dot patterns with a resolution of >4,500 pixels per inch using an azide‐based photo‐crosslinking method, which is a simple and applicable to a versatile patterning or integrating process. The effect of QD ligands and solvents on the electroluminescence characteristics and pattern fidelity of QD films during the patterning process was studied.
Published Version
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