Recent advances of photolithography patterning of quantum dots for micro-display applications

Abstract

The preparation of red, green, and blue quantum dot (QD) pixelated arrays with high precision, resolution, and brightness poses a significant challenge on the development of advanced micro-displays for virtual, augmented, and mixed reality applications. Alongside the controlled synthesis of high-performance QDs, a reliable QD patterning technology is crucial in overcoming this challenge. Among the various methods available, photolithography-based patterning technologies show great potentials in producing ultra-fine QD patterns at micron scale. This review article presents the recent advancements in the field of QD patterning using photolithography techniques and explores their applications in micro-display technology. Firstly, we discuss QD patterning through photolithography techniques employing photoresist (PR), which falls into two categories: PR-assisted photolithography and photolithography of QDPR. Subsequently, direct photolithography techniques based on photo-induced crosslinking of photosensitive groups and photo-induced ligand cleavage mechanisms are thoroughly reviewed. Meanwhile, we assess the performance of QD arrays fabricated using these photolithography techniques and their integration into QD light emitting diode display devices as well as color conversion-based micro light emitting diode display devices. Lastly, we summarize the most recent developments in this field and outline future prospects.