Oxidation study of Ta–Zr coatings

Abstract

Refractory metal alloy coatings, such as Mo–Ru and Ta–Ru coatings, have been developed to protect glass molding dies. Forming intermetallic compounds in the coatings inhibits grain growth in high temperature environments when mass producing optical components. After annealing in oxygen containing atmospheres, a surface roughening of the Mo–Ru coatings and a soft oxide layer on the Ta–Ru coatings have been observed in our previous works. Oxidation resistance becomes critical in high-temperature applications. In this study, Ta–Zr coatings were deposited with a Ti interlayer on silicon wafers using direct current magnetron sputtering at 400°C. The as-deposited Ta–Zr coatings possessed nanocrystallite or amorphous states, depending on the chemical compositions. The annealing treatments were conducted at 600°C under atmospheres of 50ppm O2–N2 or 1% O2–Ar, respectively. After the annealing treatment, this study investigated variations in crystalline structure, hardness, surface roughness, and chemical composition profiles. Preferential oxidation of Zr in the Ta–Zr coatings was verified using X-ray photoelectron spectroscopy, and the microstructure was observed using transmission electron microscopy.