Abstract
Using Auger spectroscopy and ion-beam etching, we have studied the room-temperature oxidation of sputtered and electron-beam-evaporated germanium films. Large differences are observed between the oxygen profiles of sputtered and e-beam amorphous films. Sputtered amorphous films have only a very thin layer of oxide on the surface (4–5 Å), possibly because the presence of argon in the films inhibits further oxidation. In e-beam amorphous films, the heavily oxidized layer is also thin (7–8 Å), but some oxygen is present as far as 200 Å into the samples.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
