Abstract
An ultra high vacuum system of thermal desorption spectroscopy (TDS) was constructed in order to compare the outgassing property of many different short samples rapidly. TiN films deposited on stailness steel plates were measured by TDS. The property of the TiN film depended highly on the preparation technique and condition, i.e. the structure of the film. High bias voltage and low nitrogen pressure during the deposition process by hollow cathode discharge and reactive sputtering resulted in a low outgassing rate in the TiN films. The TiN film prepared at the controlled conditions worked as a gas barrier for hydrogen desorption from the stainless steel substrate and showed a lower outgassing rate than stainless steel under the same conditions (<450°C).
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