Abstract
In this paper, we present results on the fabrication of porous alumina membranes on silicon substrates with a long-range order induced by nanoimprint lithography. Fabricated porous alumina matrices present a perfect triangular array of vertical cylindrical pores on areas of 500 × 500 μm 2 corresponding to the imprinted surfaces. Also, we demonstrate that it is possible to have a directed density multiplication during the pore formation, compared to the nanoimprint mold, by the initial indentation of only one third of the expected alumina pores. The gold catalyst, needed for nanowires growth, is deposited at the bottom of each pore by electrochemistry. The proposed process is scalable to wafer-scale areas, compatible with microelectronics fabrication standards and is not limited to non-fragile substrates like direct bulk aluminum nanoindentation.
Published Version
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