Abstract
AbstractA generic method for the growth of high density silicon nanowires in nano channels of alumina is presented. All fabrication steps are shown. Using nanoimprint lithography, fabricated porous alumina matrices present a perfect triangular array of vertical cylindrical pores. The gold catalyst was deposited at the bottom of the pores by an electrochemical way and catalytic growth of silicon nanowires was performed in a Chemical‐Vapour‐Deposition reactor. Scanning Electron Microscopy images are presented and detailed. We show that this system is the first step for the elaboration of a solar cell based on silicon core‐shell nanowires. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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