Abstract
The fabrication of organic light-emitting microdevices (micro-OLEDs) by nanoimprint lithography (NIL) using diamond molds fabricated by chemical vapor deposition (CVD) was investigated. The diamond molds used in the NIL process were fabricated with the Bi4Ti3O12 octylate (oxide) mask used in electron beam lithography technology. The diamond molds of convex dots of 30 µm square with 60 µm pitch were fabricated. The optimum imprint conditions were found to be as follows: imprinting pressure, press duration, substrate temperature and removal temperature of 0.8 MPa, 15 min, 180°C and 70°C, respectively. The device structure of 30-µm-square-dot OLEDs fabricated by imprinting is indium tin oxide (ITO) [anode]/poly(9-vinylcarbazole) (PVK) and coumarin-6 (C6) (0.1 µm thick) [hole transport and emitting layers]/8-hydroxyquinoline-aluminum (Alq) (50 nm thick) [electron transport layer]/aluminum (Al) (0.1 µm thick) [cathode]. The fabrication and operation of micro-OLEDs with 30 µm square dots in diamond-mold NIL were successfully demonstrated.
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