Abstract

We studied the possibility to form long-range ordering of self-assembled nanodot arrays with a dot size of 6nm and a dot pitch of 12nm using guide-line templates for ultrahigh-density patterned media. This was realized by using self-assembled block copolymers of polystyrene-poly dimethyl siloxane (PS-PDMS) and the templates made of hydrogen silsesquioxane (HSQ) negative electron beam (EB) resist. We have demonstrated that the method could possibly achieve a minimum pitch of about 10nm using PS-PDMS of molecular weight 7000–1500g/mol and EB-drawn guide lines. These results evidence the promising potential of a technology for achieving 5 Tbit/in2 magnetic storage devices.

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