Optical, electronic, and microstructural properties of mixed phase RF magnetron sputtered vanadium oxide thin films on quartz and aluminized quartz

Abstract

Amorphous vanadium pentoxide (major phase) thin films of various thicknesses were grown on the substrates that possessed low (aluminized quartz) and high (quartz) infrared (IR) emittance property utilizing radio frequency (RF) magnetron sputtering technique. Microstructural characterizations are carried out by several techniques such as noncontact optical profilometry, energy dispersive X‐ray (EDX) spectroscopy, X‐ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and X‐ray diffraction (XRD). The as‐grown amorphous films show stoichiometric vanadium oxide, where vanadium is in V5+ as a major proportion compared with V4+ states. Thermo‐optical properties, namely, solar transmittance (τs), reflectance (ρs), absorptance (αs) and IR emittance (εir) along with optical constant, for example, optical band gap, are evaluated. A modified Urbach equation was used to simulate the optical absorption data to understand the presence optical absorption below the band edge.