Optical Calibration of a Submicrometer Magnification Standard.

Abstract

The calibration of a new submicrometer magnification standard for electron microscopes is described. The new standard is based on the width of a thin thermal-oxide film sandwiched between a silicon single-crystal substrate and a polysilicon capping layer. The calibration is based on an ellipsometric measurement of the oxide thickness before the polysilicon layer is deposited on the oxide. The uncertainty in the derivation of a thickness for the layer from the ellipsometric parameters is also derived.