Abstract
A one-dimensional analytic solution, which is valid for general collision frequencies and device lengths, has been obtained for plasma heating in a planar-type inductively coupled plasma (ICP) discharge. The analytic solution agrees with a particle simulation result based on the particle in cell method, and it indicates the existence of an optimum chamber length. An exact analytic solution for the surface impedance is obtained in the form of a series expansion. It is also shown that a simplified approximate form may be used for high-density ICP discharges. \textcopyright{} 1996 The American Physical Society.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
