Abstract

It is shown that the solid-state reaction (SSR) taking place in multilayers during additional heat treatment, and the high temperature sequential deposition (HTSD) of the component materials are complementary techniques in studying the reactive diffusion. The formation of amorphous Al2Pt phase has been analysed by these two techniques. The diffusion coefficients of Al in the amorphous phase, determined by these techniques, show good agreement. The nucleation and grain growth of amorphous compound phases have been proven for the first time.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call