Abstract
Apparatus and technological protocols developed at the Budker Institute of Nuclear Physics, Siberian Branch, Russian Academy of Sciences (BINP SB RAS), for the method of the deep X-ray lithography of high-aspect-ratio microstructures with an arbitrarily specified topological pattern are presented. The novelty of the approach described is the use of the direct formation of deep LIGA structures in a SU-8 negative photoresist with a diaphragmed SR (synchrotron radiation) microbeam with the possibility of changing the diaphragm during exposure.
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