Abstract

We investigated the effects of a high density <TEX>$O_2$</TEX> plasma treatment on the structural and electrical properties of Ga-, B- codoped ZnO (GZOB) films. The GZOB films were deposited on polymer substrate without substrate heating by DC magnetron sputtering. Prior to the GZOB film growth, we treated a polymer substrate with highly dense inductively coupled oxygen plasma. The optical transmittance of the GZOB film, about 80 %, was maintained regardless of the plasma pre-treatment. The resistivity of the GZOB film on PC substrate decreased from 9.08 <TEX>${\times}$</TEX> <TEX>$10^{-3}$</TEX> <TEX>${\Omega}-cm$</TEX> without an <TEX>$O_2$</TEX> plasma pre-treatment to 2.12 <TEX>${\times}$</TEX> <TEX>$10^{-3}$</TEX> <TEX>${\Omega}-cm$</TEX> with an <TEX>$O_2$</TEX> plasma pre-treatment. And PES substrate decreased from 1.14 <TEX>${\times}$</TEX> <TEX>$10^{-2}$</TEX> <TEX>${\Omega}-cm$</TEX> without an <TEX>$O_2$</TEX> plasma pre-treatment to 6.13 <TEX>${\times}$</TEX> <TEX>$10^{-3}$</TEX> <TEX>${\Omega}-cm$</TEX> with an <TEX>$O_2$</TEX> plasma pre-treatment.

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