Abstract
We have demonstrated a nondestructive method using ultraviolet (UV) photolithography to fabricate micrometer-sized conducting polymer structures. By coating a polymer film on patterned photoresist and then performing liftoff, UV exposure to the conducting polymer film was prevented throughout the lithography processes. We created features down to 1μm with high yield. Such complementary metal-oxide-semiconductor-compatible microfabrication can be applied generally to various organic films, and may allow the speed of organic electronics to be improved. Organic thin-film transistors (OTFTs) were fabricated using poly(3-hexylthiophene) as the active material, and typical OTFT characteristics were obtained.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
