Abstract
AbstractWater microdroplets containing organic and fluorinated compounds, such as formate, perfluorooctanoic acid (PFOA) and triflic acid, were exposed to a radiofrequency glow discharge plasma with a droplet residence time on the order of milliseconds. Triflic acid remained unaffected by any plasma condition while >75% decomposition of formate and PFOA could be achieved. In situ hydroxyl (OH)‐laser‐induced fluorescence measurements near the droplets confirmed that the conversion was independent of the OH flux to the droplet. A series of control experiments suggest that the contribution of vacuum UV photons in such decomposition of aqueous compounds can be significant for He and He + 17% Ar plasmas and can also explain unexpected decomposition trends as a function of droplet residence time in the plasma.
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