Abstract
The IEEE has recently approved the IEEE Std. Advanced Library Format (ALF) standard, which specifies a modeling language for IC technology, cells, and block. EDA applications can use ALF as a technology library description for cell- and block-based design. ALF is a technology enabler for EDA tools that create as well as consume ALF models. Not surprisingly, existing and emerging ALF applications for nanometer technology include layout optimization of cell-based ICs for signal integrity; reliability and manufacturability; RTL design planning and prototyping; and the analysis of power consumption and power integrity from behavioral to physical abstraction levels. As a language, ALF had to offer semantics and description capabilities that allowed the construction of meaningful modeling data that are self-descriptive and general enough for existing and new EDA applications.
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