Abstract
The radical copolymerization of 2-chloromethyl-1-(p-vinyl phenyl)cyclopropane with glycidyl methacrylate is carried out. The composition and structure of the obtained copolymer are established. The constant values of relative activity of monomers are determined and Q-е parameters on Alfrey-Price are calculated. The photosensitivity of new cyclopropane and epoxy-containing photosensitive copolymers is studied. The photochemical structuring is investigated and it is established that the synthesized polymer has a photosensitivity (56 cm2/J) and can be used for creation of photosensitive material.
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