Preparation and application of photosensitive copolymers for PDP barrier ribs formed by photolithography

Abstract

In this work, the photosensitive paste was prepared. It was comprised of inorganic particles and a photosensitive organic component. The inorganic particles included glass, ceramics, and metals. The organic component should contain at least the following photosensitive materials: photosensitive monomers, photoreactive copolymer and photopolymerization initiators. The photoreactive copolymer played a role of an adhesive in the photosensitive paste. Meanwhile in the development stage, the carboxyl groups of the copolymer reacted with the alkalescent developer. Following this, the unexposed part must be removed and an excellent pattern can be formed. A series of three-component acrylic copolymers (MAA/St/MMA) were designed, and then synthesized via free radical polymerization. Subsequently glycidyl methacrylate (GMA) was employed to modify the prepared copolymers through ring-opening reactions between the carboxyl groups and the epoxide groups. Eventually the photosensitive copolymers were obtained and used to form the barrier ribs of PDPs. The chemical structure, glass transition temperature, acid value and molecular weight of photosensitive copolymers had different effects on the structure and pattern of PDP barrier ribs. Through analyzing effects of different polymer performance parameters on the patterns of barrier ribs, the optimal photosensitive copolymer was acquired.